Spin Coater – Best Tools

SC110-B Spin Coaters are designed to coat a variety of substrates from small pieces to 8” round wafers.

Specification:

Substrate size: Up to 8” diameter wafers;

Maximum speed: 10,000 rpm;

Vacuum: Venturi (Heavy samples must be rotated at a slower speed – risk of being thrown).

Jeol high-resolution scanning electron microscope, model JSM 7800F, with Schottky field emission gun – with ZrO / W emitter. LED / UED secondary electron detector, in LDF / SEM / GB observation modes. Sample holder adapted for measurements in STEM mode. Voltage acceleration from 0.5 to 30 kV. Magnification from 10 to 1,000,000x. Equipped with an Oxford brand energy dispersive spectroscopy analyzer, model X-Max 80, and a Deben beam blanker for nano manufacturing using electron beams.

Specification: High-resolution scanning electron microscope, equipped with a secondary electron and energy-dispersive X-ray detector, operating from 0.5 to 30 kV, with magnification from 10 to 1,000,000x. With ultimate edge resolution of 0.8 nm.

PLASMA ZEPTO VERSION 2
Chamber Dimension: 105 mm in diameter by 300 mm in depth.
Chamber Material: Quartz
Chamber Volume: approximately 2.6 liters.
Gas supply: 2 gas channels with individual adjustment (flow meter)
Generator: 40KHz/100W.
Operation in oxygen and/or argon atmosphere.

Brand/Model: Oxford Instruments / Plasma Pro NGP80

Description: The reactive ion etching system with power of up to 300W can process samples with a maximum diameter of 4” with temperature control between 0 and 80°C. The gases available for work are: CF4, SF6, CHF3, Ar, and O2. The system is dedicated to silicon corrosion and can, upon request, process other classes of materials.

Specifications:

Maximum substrate size: 4”

Maximum power: 300W

Available gases: CF4, SF6, CHF3, Ar, and O2

Process temperature: 0 to 80°C

Brand/Model: Quantum Design / Micro Writer ML3

Description: Rapid prototyping photolithography system with 365nm laser (i-line) and minimum resolution of 1µm, under specific conditions. The system holds samples up to 6” in diameter. The working file format is .CIF, other formats are accepted upon request.

Specifications:

Maximum substrate size: 6”

Wavelength: 365nm (i-line)

Maximum resolution: 1um

The PlasmaPro 80 reactive ion etch (RIE) is a compact system. Its design allows for fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high-performance processes using optimized electrode cooling and excellent substrate temperature control.

Specification:
Substrate size: It is possible to corrode samples from 8 mm x 8 mm to wafers of 100 mm in diameter;
Available gases: CF4, SF6, CHF3, O2, Air;
System dedicated to Silicon corrosion.

Electron beam induced deposition (E-beam evaporation)
Specification:
Source: 5kV;

Current: Max. 600 mA;

Sample size: ≤ 100 mm;

Deposition chamber with capacity for up to 4 targets;

Working pressure in the order of 1 x 10-7 Torr;

Glassy carbon crucibles of equal size 2cc
Available materials: Au, Cr and Al2O3

Nikon optical microscope, model Eclipse LV100ND, equipped with five objective lenses, free oil type, with 5, 10, 20, 50 and 100x magnification, in bright field or dark field system. Optics for analysis by reflection and transmission of light. Colorization and blocking filters. Polarized light system. Nikon camera, model DS-Fi2, and NIS-Elements v.4.50 capture and processing software.

Specification: Optical microscope with final magnification of up to 1000x, in a reflected or transmitted light system. We have 4 units of this equipment available, with the same specifications.

Brand/Model: Anric Technologies / AT-410

Description: Thermal deposition system using atomic layers with process temperature control of up to 300°C. It is possible to grow the following materials: Al2O3, SiO2 and TiO2. The system also has an ozone generator to be used in conjunction with the precursors. The organometallic precursors for the available materials are respectively: TMA (Al), TDMAS (Si) and TDMAT (Ti). Maximum sample size is 4” in diameter.

Specifications:

Maximum substrate size: 4”

Elements for deposition: TiO2, Al2O3, SiO2

Process temperature: up to 300°C

Ozone generator for SiO2 processes

Brand/Model: Best tools / SC110-B

Description: Solution spreading system with rotation control of up to 10,000 rpm. It is possible to create recipes with several steps, including ramp, time and speed in each step. The system holds samples up to 6” in diameter and at least 9mm x 9mm, limited by the rotating chuck clamp (Chuck).

Specifications:

Maximum substrate size: 6”

Maximum speed: 9000 rpm

The AT410 ALD system provides a solution for conductive and conformal thin films for 3D sample preparation, while also providing traditional 2D coatings that are currently grown using sputtering/evaporation.
It has an ozone generator.
Specification:
Sample holder up to 4” in diameter.
Processes with up to 5 precursors (Oxides, Elementals, Nitrides and Sulfides)
Deposition of: aluminum oxide, silicon dioxide and titanium dioxide.
High quality for small sample growth projects.
Precise dosing system.

Bruker atomic force microscope, Dimension Icon model, with ScanAsyst measurement optimization technology. It operates in contact, intermittent contact and non-contact modes, enabling electrical, magnetic and force analyzes in general for different materials. It is a powerful tool in characterizing surface roughness, phase differentiation, lateral size and depth, as well as step and thickness of sheets and films.

Specification: Atomic force microscope, with ScanAsyst technology, for faster and more optimized captures.

Micro Writer ML3 (Direct prototyping)

A direct write photolithography machine for rapid prototyping

Specification:

Source: High power laser with 405 nm spectrum;

Substrate sizes: up to 100 mm diameter wafers;

Resolution 1 µm

Brand/Model: MBRAUN / no model (customized)

Description: Physical deposition system using electron beam with 3kW power source. The system has 4 2cc rotating targets, allowing the sequential deposition of 4 different elements. The base working pressure is 2x10-7 mbar and holds samples up to 4” in diameter. Larger samples can be deposited upon request. It is possible to carry out depositions with manual and automatic control, both of thickness and deposition rate. The thickness is controlled by means of a shutter and the deposition rate by means of a quartz crystal with 6MHz operating frequency.

Specifications:

Maximum substrate size: 6”

Possibility of sequential deposition of up to 4 different targets

Base pressure: 3x10-7 mBar

Available gases: Upon request

Rotating sample holder

Brand/Model: Diener Electronic / Plasma zepto version 2

Description: Benchtop plasma system for cleaning and passivating surfaces. With a maximum power of 100W and a maximum working pressure of 1.5mbar, it is possible to load samples with maximum dimensions of 3” in diameter. The gases available for work are: Argon (Ar) and oxygen (O2).

Specifications:

Maximum substrate size: 3”

Maximum power: 100W

Available gases: Air, and O2

Nikon optical microscope, model Eclipse LV100ND, equipped with five objective lenses, free oil type, with 5, 10, 20, 50 and 100x magnification, in bright field or dark field system. Optics for analysis by reflection and transmission of light. Colorization and blocking filters. Polarized light system. Nikon camera, model DS-Fi2, and NIS-Elements v.4.50 capture and processing software.

Specification: Optical microscope with final magnification of up to 1000x, in a reflected or transmitted light system. We have 4 units of this equipment available, with the same specifications.

Hitachi benchtop scanning electron microscope, model TM3000, equipped with a high-sensitivity semiconductor for detection by backscattered electrons in COMPO, Shadow 1, Shadow 2 and TOPO operating modes, at low vacuum.  Dedicated sample holder for surface and transversal readings. Voltage acceleration of 5 and 15kV. Magnification from 15 to 30,000x. It has a motorized stage movement system.

Specification: Low vacuum scanning electron microscope, operating at 5 or 15 kV, with magnification from 15 to 30,000x, in low vacuum, enabling analysis of more insulating materials.

The Confocal Raman Microscope allows you to perform analyzes at wavelengths 633, 532 and 488 nm. With a UHTS spectrometer with coupled optical fiber, it has high lateral resolution (<0.5 um)  and is a non-destructive technique. In addition to performing point planar (X-Y) and depth (Z) analyses, time acquisition and mapping, its confocal system allows generating ultra-fast 3D images, with up to 0.1 thousandths of a second per spectrum.

Specifications:

Laser: 488, 532 and 633 nm

Objective Lenses: 10x, 50x and 100x

Lateral resolution: <0.5um

UV-VIS-NIR spectrophotometer (185 to 3300 nm) has double-beam optics and a signal detection system with three independent detectors. Allows you to carry out measurements in Spectrum, Photometric and Kinetic modes, in addition to analyzing materials in solution, film or powder. It also has an Integration Sphere module that allows reflectance measurement.

Specifications:

Wavelength Range:185 to 3300 nm

Integration Sphere Module (220 nm to 2600 nm)

Resolution 0.1nm

Brand/Model: SPI Supplies / Plasma Prep III

Description: Benchtop plasma system for cleaning and passivating surfaces. With a maximum power of 100W and a maximum working pressure of 250mTorr, it is possible to load samples with maximum dimensions of 3” in diameter. The gases available for work are: Argon (Ar), oxygen (O2) and nitrogen (N2).

Specifications: Power 100W, maximum pressure 250mTorr, maximum substrate size 3”. Aces available: Air, O2 and N2

Olympus inverted microscope, model IX83, fully motorized, integrated with the VT-iSIM system for super image resolution and high speed. Operates with a set of three objectives (UPLXAPO20X, UPLSAPO60XS and UPLAPO100XOHR). CoolLED’s pE-300white Epi Fluorescent LED Lighting. Hamamatsu ORCA-Fusion sCMOS image capture system, with a maximum resolution of 2304 x 2304 (5.3 Megapixels) at a maximum speed of 100 frames/second and a pixel size of 6.5 µm X 6.5 µm. In the field solid state laser is equipped with four different wavelengths (L405P100, L488P150, L561P100 and L640P100).

Specification: Inverted confocal laser scanning and fluorescence microscope. Equipped with 4 different lasers (405, 488, 561 and 640 nm). With automated slice system, in Z, on a nanometric scale.

Olympus optical microscope, model BX51M, equipped with five objective lenses, free oil type, with 5, 10, 20, 50 and 100x magnification, in bright field or dark field system (for 10 and 20x lenses). Final resolution delivery in 1x or 2x, reaching up to 2000x magnification. Optics for light reflection analysis. Yellow colorization filter. Polarized light system. Olympus brand camera, model SC30, and Olympus Stream Essentials 2.1 capture and processing software.

Specification: Optical microscope with final magnification of up to 2000x, in a reflected light system.

Used to characterize nano and microparticles in dispersion, peptides and macromolecules. Includes three measuring angles for determining particle size (15°,90°,175°). Allows zeta potential measurements at low voltages. Laser: 658 nm (red).

Specifications:

Analysis range:0.3 nm-10 um (DLS) and 3.8 nm at 100 um (ELS)

Refractive index:1.28 - 1.50

Detection angle: 15, 90 and 175°

Electrophoretic Light Scattering (ELS): >+-1000 mV

Static Light Scattering (SLS):980 Da - 20 MDa

Dynamic Light Scattering (DLS):0.3nm - 10um

Brand/Model: MBRAUN / Unilab

Description: Workstation under an Argon (Air) atmosphere, with control of oxygen (O2) and humidity (H2O) levels ≤ 5 ppm. It can be used for storing and handling critical chemical reagents, carrying out experiments and manufacturing processes that require an inert atmosphere. The system has automatic pressure control, lighting and internal electrical outlets to assist in any experiments.

Specifications: Argon atmosphere (Air)

The X-ray diffractometer allows you to analyze samples such as powder, membranes, fibers and thin films, using the Bragg-Bretano, GID and XRR configuration. It has an X-Y-Z table and attached camera for microdiffraction measurements. The LYNXEYE XE-T detector allows acquisition in 0D, 1D and 2D

Specifications:

Peak position accuracy <0.01°

Copper X-Ray Source

LYNXEYE XE-T Detector

Modes: Bragg-Bretano, GID and XRR

XPS is a tool used for surface analysis of materials, elemental characterization and chemical environment, with an analysis thickness of 5-10nm. It has an Al Kα X-ray monochromator, which allows the analysis area to be adjusted from 50 to 400 um. It has UPS mode, work function measurement module and sample holder for angle measurement.

Specifications:

Argon electron/ion flood charge neutralization

Argon-EX06 ion source

Operating modes: Scan, Snapshot and SnapMap

UV photoelectron spectroscopy (UPS)

Micro-focused X-ray monochromator:50 to 400 um

Kinetic energy range: 5-1500eV

FTIR equipment with Attenuated Total Reflectance (ATR) module. It allows analyzes with a resolution of 0.5 cm-1, with an operating range of 400 to 7800 cm-1 (FTIR) and 600 to 4000 cm-1 (ATR). Allows analysis of liquid and solid materials (films and powder).

Specifications:

Maximum Resolution :0.5 cm-1

Wavenumber range: 400 to 7800 cm-1 (FTIR) and 600 to 4000 cm-1 (ATR)

Attenuated Total Reflectance (ATR) Module-ZnSe Crystal (pH 5-9)

S/N ratio: 30000 : 1

Brand/Model: MBRAUN / Unilab

Description: Workstation under an Argon (Air) atmosphere, with control of oxygen (O2) and humidity (H2O) levels ≤ 5 ppm. It can be used for storing and handling critical chemical reagents, carrying out experiments and manufacturing processes that require an inert atmosphere. The system has automatic pressure control, lighting and internal electrical outlets to assist in any experiments.

Specifications: Argon atmosphere (Air)

High-resolution, high-sensitivity mass spectrometer of the MALDI type, with ESI (Electrospray Ionization) or APCI (Atmospheric-pressure chemical ionization) ionization sources with Ion trap analyzer, which allows MSn fragmentations to be obtained. Applications: Identification and characterization of proteins and peptides; Analysis of organic compounds;

Greenhouse used for incubating inoculated culture media and monitoring microbial growth.

Keysight DSOZ592A 59GHZ Digital Oscilloscope, with low noise, 59 GHz real-time bandwidth. Sampling rate of 160 GSa/s and 80 GSa/s in 1 channel and 2 channels respectively.

It combines FT-IR microscopy and infrared laser imaging offering all transmission, reflection and ATR measurement modes.

Specifications:

-ATR module

-Spot measurement and chemical map